Seitenbild Seitenbild Seitenbild
  • +++

    A big thank you goes to all attendees, authors, speakers, exhibitors and sponsors for their contribution to the success of MNE 2013!

    +++

SCOPE OF THE CONFERENCE

TECHNICAL TOPICS

The MNE Conference will address issues in micro and nano-fabrication and manufacturing using lithography and other patterning related approaches, with themes that will include:

Micro and Nano Lithography

Nano-imprint and soft-lithography:
systems, alignment, stamp fabrication, processes and imprinting methods, results and applications, dedicated resists.

Maskless lithography:
photon, charged particles, scanning probe techniques, sources, optics, systems, alignment, modelling, throughput, 3D lithography.

Photon lithography:
DUV, immersion, EUV, sources, optics, systems, mask technology, alignment, optical proximity correction, lithography modelling, novel techniques.

Electron and ion beam lithography:
sources, optics, systems, alignment, proximity corrections, e-beam mask writer, ion and electron beam surface interactions.

Materials for micro and nano lithography:
resists, resist structures, resist processes, nanostructured materials.

Micro and Nano Fabrication

Nanofabrication with top-down and bottom-up approaches:
novel fabrication methods, self-assembly and directed self-assembly, combination of top-down and bottom-up processes, surface nano engineering, resolution limits, nanomanipulation, integration of nano-objects, tip-induced fabrication, nanoscale modelling, molecular technologies.

Pattern transfer and plasma etching:
nanoscale etching, lithography/etching interactions, etching of new materials, novel etching chemistry, etching damage, deep etching, lateral etching, lift-off, plating, sputtering, beam etching/deposition, modelling.

Nanometrology:
inspection, testing, metrology and in-situ process measurements, devices and circuits, reliability, nanoscale metrology.

Micro and Nano Devices

Nanoelectronic/photonic devices:
nanoelectronics, single electron transistor devices, quantum dots, nano-optics/nanophotonics, plasmonics, nanowire and nanotube based devices, high density data storage devices, nano magnetics, nano devices, molecular devices, characterisation.

Micro and nano manufacturing:
transfer of nanofabrication and nanoscience from laboratory to industry, manufacturable production of nanostructures, devices and systems.

Micro and Nano Systems and their Fabrication: MEMS, NEMS, Micro-Optics, Photovoltaics
Surface and bulk micromachining, 3D structures, stereolithography, rapid prototyping, moulding, new materials, sensors and actuators, M(O)EMS, NEMS, RF-MEMS/NEMS, electromechanical passive devices, RF mechanical resonators.

Micro and Nano Fabrication for Life Science

Micro and nanofabrication of fluidic systems:
characterisation, devices for biology, chemistry, medicine, micro-biodevices, biodetection devices, cell sorting devices, cell/micro-nanostructure interactions, neuronal devices, biochips and lab-on-a-chip, μTAS, BioMEMS, micro-nano devices for chemical analysis, gas sensors.

Bio-inspired technologies:
bionanomachines, bioassembly of nanomaterials, hybrid devices.

MNE 2013 London Logo

Contact

Centre for Continuing Professional Development
Imperial College London
Exhibition Road
South Kensington Campus
London SW7 2AZ

PHONE: +44 (20) 7594 6886
FAX: +44 (20) 7594 6883
E-MAlL: Please enable Javascript

Infobox

Important Deadlines

  • Early registration rates extended until: 20 August 2013
  • Notification to Authors: 12 July 2013
  • Extended Abstract Deadline: 7 June 2013
  • Abstract Deadline: 31 May 2013